Josephson effect in indium bridges with large dimensions
Identifieur interne : 000853 ( Main/Exploration ); précédent : 000852; suivant : 000854Josephson effect in indium bridges with large dimensions
Auteurs : RBID : ISTEX:10909_1980_Article_BF00117941.pdfAbstract
We report experiments searching for Josephson behavior in indium bridges with dimensions in the following range : thickness 2–3 Μm ; length 3–15 Μm ; width 10–100 Μm. Josephson behavior has been observed in bridges up to 20 Μm wide prepared by a single-step evaporation procedure and photolithography. In this case the V-I characteristics, including the rf-induced step structure, can be well described by the RSJ model if the amplitude of the applied rf current exceeds a distinct value. These results and in particular the magnitude and temperature dependence of the normal resistance of the Josephson element can be explained by the formation of an extended, “two-dimensional” phase slip center. Indium bridges prepared by a multiple-step evaporation method often show complicated behavior, the Josephson effect being localized somewhere within a contamination layer separating the underlay films from the overlay film representing the bridge. Such multiple-step evaporation procedures should therefore be avoided.
DOI: 10.1007/BF00117941
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<author><name>R. P. Huebener</name>
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<front><div type="abstract" xml:lang="eng">We report experiments searching for Josephson behavior in indium bridges with dimensions in the following range : thickness 2–3 Μm ; length 3–15 Μm ; width 10–100 Μm. Josephson behavior has been observed in bridges up to 20 Μm wide prepared by a single-step evaporation procedure and photolithography. In this case the V-I characteristics, including the rf-induced step structure, can be well described by the RSJ model if the amplitude of the applied rf current exceeds a distinct value. These results and in particular the magnitude and temperature dependence of the normal resistance of the Josephson element can be explained by the formation of an extended, “two-dimensional” phase slip center. Indium bridges prepared by a multiple-step evaporation method often show complicated behavior, the Josephson effect being localized somewhere within a contamination layer separating the underlay films from the overlay film representing the bridge. Such multiple-step evaporation procedures should therefore be avoided.</div>
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<abstract lang="eng">We report experiments searching for Josephson behavior in indium bridges with dimensions in the following range : thickness 2–3 Μm ; length 3–15 Μm ; width 10–100 Μm. Josephson behavior has been observed in bridges up to 20 Μm wide prepared by a single-step evaporation procedure and photolithography. In this case the V-I characteristics, including the rf-induced step structure, can be well described by the RSJ model if the amplitude of the applied rf current exceeds a distinct value. These results and in particular the magnitude and temperature dependence of the normal resistance of the Josephson element can be explained by the formation of an extended, “two-dimensional” phase slip center. Indium bridges prepared by a multiple-step evaporation method often show complicated behavior, the Josephson effect being localized somewhere within a contamination layer separating the underlay films from the overlay film representing the bridge. Such multiple-step evaporation procedures should therefore be avoided.</abstract>
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